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Field Guide to Optical Lithography

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Field Guide to Optical Lithography

The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Contents
- Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index
Country USA
Manufacturer SPIE Publications
Binding Spiral-bound
UnitCount 1
EANs 9780819462077
ReleaseDate 0000-00-00

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